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Customized Size Square Sic Chip Low Lattice Mismatch With High Thermal
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Brand Name:zmsh
Model Number:10x10mm
Price:by case
Supply Ability:1000pcs
Delivery Time:within 15days
Company Data
Verified Supplier
Contact Person
Wang
Business Type:
Manufacturer Agent Importer Exporter Trading Company
Officials:
Room.1-1805,No.1079 Dianshanhu Road,Qingpu Area Shanghai city, China /201799
Quality:
Quality Certifitation Available
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Product Details
Company Profile
Product Details
10x10mm 5x5mm customized square sic substrates ,1inch sic
wafers,sic crystal chips, sic semiconductor substrates, 6H-N SIC
wafer, High purity silicon carbide wafer
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we offers semiconductor materials, especially for SiC wafer, SiC
substate of polytype 4H and 6H in different quality grades for
researcher and industry manufacturers. We has a good relationship
with the SiC crystal growth factory and,we own also have the SiC
wafer processing technology, established a production line to
manufacturer SiC substrate and SiC wafer. As a professional company
invested by the leading manufacturers from the fields of advanced
and high-tech material research and state institutes and China's
Semiconductor Lab, we are devoted to continuously improve the
quality of SiC wafer, currently substates and develop large size
substrates.
Application areas
1 high frequency and high power electronic devices Schottky diodes,
JFET, BJT, PiN,
diodes, IGBT, MOSFET
2 optoelectronic devices: mainly used in GaN/SiC blue LED substrate
material (GaN/SiC) LED
Advantagement
• Low lattice mismatch• High thermal conductivity
• Low power consumption
• Excellent transient characteristics
• High band gap
commen 2inch size for sic substrates
| 2inch diameter Silicon Carbide (SiC) Substrate Specification | ||||||||||
| Grade | Zero MPD Grade | Production Grade | Research Grade | Dummy Grade | ||||||
| Diameter | 50.8 mm±0.2mm | |||||||||
| Thickness | 330 μm±25μm or 430±25um Or 1000um±25um | |||||||||
| Wafer Orientation | Off axis : 4.0° toward <1120> ±0.5° for 4H-N/4H-SI On axis : <0001>±0.5° for 6H-N/6H-SI/4H-N/4H-SI | |||||||||
| Micropipe Density | ≤0 cm-2 | ≤5 cm-2 | ≤15 cm-2 | ≤100 cm-2 | ||||||
| Resistivity | 4H-N | 0.015~0.028 Ω•cm | ||||||||
| 6H-N | 0.02~0.1 Ω•cm | |||||||||
| 4/6H-SI | ≥1E5 Ω·cm | |||||||||
| Primary Flat | {10-10}±5.0° | |||||||||
| Primary Flat Length | 18.5 mm±2.0 mm | |||||||||
| Secondary Flat Length | 10.0mm±2.0 mm | |||||||||
| Secondary Flat Orientation | Silicon face up: 90° CW. from Prime flat ±5.0° | |||||||||
| Edge exclusion | 1 mm | |||||||||
| TTV/Bow /Warp | ≤10μm /≤10μm /≤15μm | |||||||||
| Roughness | Polish Ra≤1 nm | |||||||||
| CMP Ra≤0.5 nm | ||||||||||
| Cracks by high intensity light | None | 1 allowed, ≤2 mm | Cumulative length ≤ 10mm, single length≤2mm | |||||||
| Hex Plates by high intensity light | Cumulative area ≤1% | Cumulative area ≤1% | Cumulative area ≤3% | |||||||
| Polytype Areas by high intensity light | None | Cumulative area ≤2% | Cumulative area ≤5% | |||||||
| Scratches by high intensity light | 3 scratches to 1×wafer diameter cumulative length | 5 scratches to 1×wafer diameter cumulative length | 5 scratches to 1×wafer diameter cumulative length | |||||||
| edge chip | None | 3 allowed, ≤0.5 mm each | 5 allowed, ≤1 mm each | |||||||
picture size: 10x10x0.5mmt,
tolerance:±0.03mm
match depth x width: 0.4mmx0.5mm
TYPE:4H-semi
surface: polished (ssp or dsp)
Ra:0.5nm
FAQ
1. Q:What is your package ? Are they safe ?
A: we provide Automatic adsorption film box as package.
2.Q: What is your payment term ?
A:Our payment term is T/T 50% in advance ,50% before delivery .
3.Q:How can I get some samples?
A:Becauce customized shape products, we hope you can order min lot
as sample.
4.Q: How long time we can get the samples ?
A: We send the samples in 10- 25 days after you confirm .
5.Q:How does your factory do regarding quality control ?
A:Quality first is our motto ,Workers always attach great
importance to quality controlling from
the very beginning to the very end .
Company Profile
SHANGHAI FAMOUS TRADE CO.,LTD
SHANGHAI FAMOUS TRADE CO.,LTD. locates in the city of
Shanghai, Which is the best city of China, and our factory is founded in Wuxi city in 2014.
We specialize in processing a varity of materials into
wafers, substrates and custiomized optical glass parts.components
widely used in electronics, optics, optoelectronics and many other
fields. We also have been working closely with many domestic and
oversea universities, research institutions and companies, provide
customized products and services for their R&D projects.
It's our vision to maintaining a good relationship of cooperation with our all
customers by our good reputatiaons.
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